Technology for achieving Metal Contamination-Free (MCF)
We have a proven proprietary MCF technology with over 40 years of experience, enabling us to manage metal content (or metal concentration) at the ppb level.
We have been providing high-quality products to the electronic materials field since the 1980s, when personal computers and mobile phones first began to spread in society. In this business, we have established our proprietary MCF (Metal Contamination Free) technology to reduce the amount of metal contamination in our products to a bare minimum in response to our customers’ needs for higher quality. In the electronic materials field, we are meeting the high demand for photoresists and other electronic materials, in line with the progress of miniaturization, increased integration and enhanced performance of IT-related products. We are a chemicals manufacturer that implements total management (from research and development to manufacturing, process control and quality control) in order to ensure stable manufacturing using MCF technology.
- (1) Metal contamination control in the ppb range
- (2) Flexible scaling from grams to tons in a clean room (class 100,000 for mass production)
- (3) Metal contamination prevention in the manufacturing process and advanced metal removal technology
- (4) Metal removal technology using ultrapure water (in-house production 60m3/day)
- (5) Experience accumulated since the 1980s in the development of high-performance semiconductors
We support MCF at every phase, from research and development to mass
production.
Metal Contamination Free is a registered trademark of Sankyo Kasei.
Metal Contamination Free Facility
EL-LAB
Analysis by ICP-MS in a class 10,000 clean room and MCF study in the laboratory.
P-1(MCF PILOT)
In addition to a variety of reaction vessels ranging from 50L to 500L, the plant is equipped with a clean room for crystallization, filtration, and drying.
F-11
A state-of-the-art plant that integrates MCF technology. The roughing zone and the refining zone are separated. and refining zones to realize an advanced MCFenvironment.